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Nikkei Microdevices

August 2004 Issue : TABLE OF CONTENTS

Special Feature

Japan's intellectual property infrastructure sees continuous development - winning companies succeed by intellectual property management

Inside LSI

Low-power LSI technology for 65nm and beyond achieves leakage current reduction by double-digits at maximum

Inside Memory

Development of a thumb-sized electron microscope

Inside FPD

The reason why Sony adopted a new structure in their organic EL display that attracted much attention at SID

New Technology

Predicting the future of robot devices

Report

Report/Memory
New technology that will solve the problems regarding MRAM

Report/Memory
New film-forming technology used for RRAM

Report/Logic
Challenging the barrier posed by post-60nm generations with a new defect inspection technology

Report/Memory
SEMATECH abandoning F2 development clarifies the scenario for post-45nm lithography technology

Report/FPD
Manufacturing costs for AR films reduced by more than half, with high-speed production using atmospheric pressure plasma technology

Report/Logic
Ricoh shares how their LSI design center in China was launched in a short period of time

Report/Logic
Overall view of the latest topics, including mechanism analysis of high-k films, and organic semiconductor devices

Report/FPD
FPD market shows signs of change, with inventory of large-screen televisions apparently growing in size

Report/FPD
LCD joint-venture between Samsung and Sony starts operation

Emerging

Making micropumps for medical chips using cantilevers

Key Person

"We will become dominant in the world with PDP"

Interview

"We will vigorously strive forward to increase production and expand the types of projector lamps"

Book Review

Recognizing a "designing philosophy” behind the RTL design style

Watcher/International

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