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Microdevices November 2005 Issue
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Nikkei Microdevices |
November 2005 Issue : TABLE OF CONTENTS
SANYO Electric Co., Ltd. recovers from an earthquake
Special Feature
Wafer thickness reduced to the range of 30 to 2 μm
LSI manufacturers
compete with each other to gain superiority in the Si through-hole
technology
Inside LSI
Cortex-A8, a new-generation ARM core, marks 1 GHz operation at 65nm
Predicting
where the semiconductor joint Fab is going
Sony's SoC "HD Codec Engine" for
HD digital video
DRAMs break through their limitations with capacitor-less
structure
"ISSM 2005" report
Cooperation of APC and DFM is the key
Report LSI
Samsung secures reliability and yield with its proprietary circuit
simulator
Repot LSI
"Competition for dominance gets fiercer in oxide film etching
equipment - Conventional plasma etching is winning"
"2005 IEDM" preview
New combinations of processes appear in
succession
Inside FPD
Flash report from "FPD International 2005"
FPD
Quantitative assessment of image quality of "Sony panels"
Inside MEMS
Analyzing the winner group of MEMS companies
Emerging
Laying out nano-size wire inside Si crystal
Key Word
PRAM
Key Person
Strategy of Matsushita Electric Industrial Co., Ltd. - It takes the offensive
across the world with promo phrase of "Thin, Digital, and HD"
Key Person
"The ideal state of Japanese semiconductor industry" that
the Ministry of Economy, Trade and Industry expects to see
Focusing
on creating a flexible organization good at dealing with environmental
changes
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