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Microdevices September 2005 Issue
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Nikkei Microdevices |
September 2005 Issue : TABLE OF CONTENTS
<Features in the regular issue>
Car device business takes off
Area control
Small- to mid-size LCD panel strategy with competitive cost
Samsung adopts
maskless and non-sputtering technology, working towards becoming the
leader in production technology innovation
Facing the largest-ever process
challenge, the thinning limit of gate insulating films is overcome
IBM's
65nm ASIC brings innovation in EDA with technology to address variation
LCD
for mobile phones with limited viewing angle - a simple mechanism that
prevents others from taking a peek at the display
Sony to implement specialized
MEMS production line for gyro-sensor production
Texas Instruments changes
its package strategy to focus its operation in Japan to development
Competition
heats up in ArF immersion lithography, the issue for process is defects
caused by materials
Comprehensive look from high-k gate stack to quantum
computer component technology
The age of DFM has arrived - what Japan
should do in terms of intellectual property rights
<Features in the standalone supplement>
The next growth engine in device industry
Part 4: Application technology
World semiconductor industry eyes one
trillion U.S. dollars by 2020
China
and India experiencing rapid growth, but what should U.S. and Japan
do?
Humanoid robots to drive Si devices in the 2010s
DNA chips for research
to medical uses, and further on for the six billion population
"Semiconductor is not yet a mature industry" -
three challenges to overcome for further progress
Theme for the 21st century is "network and environment" -
mobilizing all technologies from semiconductors to nanotechnology
High-quality
Si thin film produced using biotechnology
Ion implantation equipment
using gas cluster ion beam technology
On-site service reduces test cost
Mounting optical switch on silicon
substrate to realize optical communication technology
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